ELECTRICAL CHARACTERIZATION OF THE FORWARD CURRENTVOLTAGE OF AL IMPLANTED 4H-SIC PIN DIODES

  • M.L. MEGHERBI Laboratory of Metallic and Semiconducting Materials,Mohammed Kheider University, 07000 Biskra, Algeria
  • L. DEHIMI Faculty of Science, ElhadjLakhdar University, 05000 Batna, Algeria
  • W. TERGHINI Laboratory of Metallic and Semiconducting Materials,Mohammed Kheider University, 07000 Biskra, Algeria
  • F. PEZZIMENTI DIMET-Faculty of engineering, Mediterranean University of Reggio Calabria, via graziella, 89122 Reggio Calabria, Italy
  • F.G. DELLA CORTE DIMET-Faculty of engineering, Mediterranean University of Reggio Calabria, via graziella, 89122 Reggio Calabria, Italy

Résumé

ABSTRACT
In this work,theforward current-voltagecharacteristics of n-type Al implanted 4H-SiC pin diodeshave been investigated
experimentally and by mean of numerical simulations in the 298-378K temperature range. Our simulations were performed
using proprietary simulations software. The model parameters to be calibrated in the simulation are the electron and hole
minority carriers lifetimes.The measured forward I-V characteristics showed two differentbehaviour, the leaky behaved and
well behaved diode. The later diodes were considered for simulation comparison.Employing temperature-dependent carrier
lifetimes as a fitting parameter, the simulation indicates that drift layer and bulk carrier lifetime ranging from 10ns to 50ns. We
achieved a good agreement between simulations and measured data. The measured and the simulated forward characteristics
indicate an ideality factor of about1.3for the region 2.5V-2.78Vand 2.14 in the low injection region. Activation energies of
about 1.61eV and 2.51eVare obtained respectively which are in good agreement with the expected values.
KEYWORDS: p-i-n diode, silicon carbide, silvaco, device simulation, lifetimes.

Références

R. W. Brander and R. P. Sutton, J. Phys. D 2, 309,
1969.
[2] J. A. Edmond, H. S. Kong, and C. H. Carter, Jr.,
Physica B 185, 453, 1993.
[3] H. Amano, M. Kito, K. Hiramatsu and I. Akasaki,
Jpn, J. Appl. Phys. 28,L2112, 1989.
[4] Atlas user manual 2010.
[5] Francesco G. Della Corte, Fortunato Pezzimenti,
Roberta Nipoti ''Simulation and experimental
results on the forward J–V characteristic of Al
implanted 4H–SiC p–i–n diodes''Microelectronics
Journal, Vol.38, pp.1273-1279,2007.
[6] CHEN Bin1, YANG YinTang, XIE XuanRong,
WANG Ning, MA Zhen Yang SONG Kun ,
ZHANG XianJun''Analysis of temperaturedependent
characteristics of a 4H-SiC metalsemiconductor-
metal ultraviolet photodetector
''Applied physics, Chinese science bulletin, Vol.57
No.34: 4427 4433, December 2012.
[7] M. Roschke, and F. Schwierz, ''Electron Mobility
Models for 4H, 6H, and 3C SiC'', IEEE Trans.
Electron. Devices.Vol.48, pp. 1442-1447,2001.
[8] R.C.Jeager, F.H.Geansslen, ''Simulation of impurity
freezout through numerical solution of Poisson’s
equations and application to MOS device
behaviour''IEEE Trans. Electron. Dev., Vol. 27, pp.
914-920, 1980.
[9] Shockleyand W.T.Read, ''Statics of the
recombination of holes electrons''Phys.Rev,
Vol.87,no.5, pp.835-842.Sep.1952.
[10] G. Donnarumma, V. Palankovski,S. Selberherr,
''Influence of Bandgap Narrowing and Carrier
Lifetimes on the Forward Current-Voltage
Characteristics of a 4H-SiCp-i-n Diode'', SISPA 2012,
September 5-7, 2012, Denver, CO, USA.
[11] S.Selberherr. ''Analysisand Simulation of
Semiconductor Devices’’Springer-Verlag,
1984. 70, 83.
[12] T. Hatakeyama, T. Watanabe, and T. Shinohe''
Impact ionization coefficients of 4H silicon
carbide''Applied Physics Letters, vol .85,2004.
[13] Akin Akturk,Neil Goldsman, Shahid Aslam''
Comparison of 4H-SiC impact ionization models
using experiments and self-consistent simulations
''Applied Physics Letters, vol .104, 2008.
[14] Feng. Zhao,Mohamed.M.Islam, Biplob K.Daas,
Tangali.S.Sudarshan“Effect of crystallographic
dislocations on the reverse performance of 4HSiC”,
Materials Letters, vol. 64, pp.281-283,
2010.
[15] R. Wang (PhD thesis, Rensselaer Polytechnic
Institute, (2002).
Publiée
2015-03-17
Comment citer
MEGHERBI, M.L. et al. ELECTRICAL CHARACTERIZATION OF THE FORWARD CURRENTVOLTAGE OF AL IMPLANTED 4H-SIC PIN DIODES. Courrier du Savoir, [S.l.], v. 19, mars 2015. ISSN 1112-3338. Disponible à l'adresse : >http://univ-biskra.dz/revues/index.php/cds/article/view/1207>. Date de consultation : 22 déc. 2024